Comparison ledger
Lam Research 590, Tegal 1512e, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 590Lam Research | 1512eTegal |
|---|---|---|
| OEM | Lam Research | Tegal |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Lam Research 590 | Tegal 1512e |
| Specifications | ||
| Voltage | 208V[1] | — |
| Wafer size | 6 inch[1] | — |
| RF frequency | 13.56 MHz[3] | — |
| Pressure | 2.8 Torr[3] | — |
| Gap | 0.38 cm[3] | — |
| Power (low) | 450 W[3] | — |
| Power (high) | 850 W[3] | — |
| OEM | Lam Research[1] | — |
| Model | 590[1] | — |
| Category | Etcher[1] | — |
| Power | 208V[1] | — |
| Plasma recipe entry | CF4+CHF3+He (90:30:120 sccm)[3] | — |
| Tool type | — | Industrial RIE plasma etcher system[4] |
| Stated configuration | — | With modules assembly for CI-4222[4] |
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