Comparison ledger
Lam Research AutoEtch 490, Parts, Oxford Instruments 100 ICP Fluorine, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | AutoEtch 490, PartsLam Research | 100 ICP FluorineOxford Instruments |
|---|---|---|
| OEM | Lam Research | Oxford Instruments |
| Category | Etch | Etch |
| Wafer size | 6-inch capability | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Lam Research AutoEtch 490, Parts | Oxford Instruments 100 ICP Fluorine |
| Specifications | ||
| Condition | Parts Machine, Sell it at AS IS ,Where Is term.[1] | — |
| Quantity | 1 set[1] | — |
| Wafer Size | 6-inch capability[1] | — |
| Valid Time | Subject to prior sale[1] | — |
| Lead Time | Ready to go[1] | — |
| Category | Plasma Etch[1] | — |
| Original Equipment Manufacturer | Lam Research[1] | — |
| Warranty | N/A[1] | — |
| Refund | N/A[1] | — |
| Inspection | Against appointment[1] | — |
| OEM | Lam Research[1] | — |
| Model | Lam AutoEtch 490, Parts Machine[1] | — |
| Wafer size capability | 6-inch capability[1] | — |
| System type | in-line, cassette-to-cassette, fully automated, single-wafer, double airlocked, parallel plate plasma etching system[2] | — |
| Chemistries | chlorine and Freon chemistries[3] | — |
| Applications | Polysilicon; Silicon Nitride; Refractory metal silicides; Thin dielectrics[3] | — |
| Etch Gases | — | SF6, CF4, O2, Ar, N2, CHF3, C4F8[4] |
| Cryo DRIE etch rate | — | up to 5 µm/min[4] |
| Wafer size | — | 4 inch, 6 inch, 8 inch (with clamp change)[4] |
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