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Comparison ledger

SEZ SP 203versus11600 SRD

Lam Research SEZ SP 203, Semitool 11600 SRD, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
SEZ SP 203Lam Research
11600 SRDSemitool
OEMLam ResearchSemitool
CategoryWet Processing / CleanWet Processing / Clean
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones1998 Vintage—
Control system——
Generation——
FamilyLam Research SEZ SP 203Semitool 11600 SRD
Cited variants
  • SEZ SP 203 Spin[1]
—
Specifications
Configuration200-208 V[2]Ceramic[4]
Phase3 Phase[2]—
Pinless chuck6 Inch[2]—
SoftwareMajor Version 117[2]—
Cabinet 1Main tank and Buffer tank[2]—
Cabinet 2Main tank and Buffer tank[2]—
Cabinet 3Main tank[2]—
ModificationsFFU controller; 1 cabinet drain box repaired[2]—
ManufacturerLam Research[3]Semitool[4]
CategoryWet Processing / Clean[3]—
Wafer size6 inch[2]—
Power200-208 V[2]—
Frequency50/60 Hz[2]—
Wafer handling6 Inch Bernoulli Handling[2]—
ChuckPinless chuck: 6 Inch[2]—
Vacuum exhaustExhaust Up[3]—
Chemistry cabinets3 Chemistry Cabinets[3]—
Software major version117[2]—
Software minor version2015.08.21[2]—
GEM versionGEM 5.8[2]—
Known problemsKeyboard switching; Voltage fluctuations[2]—
Model—11600 SRD[4]
Equipment type—Spin Rinse Dryer[4]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]waferpedia.comwaferpedia.com
  2. [2]inventory listing
  3. [3]waferpedia.comwaferpedia.com
  4. [4]inventory listing