Lam Research
SEZ SP 304 alternatives
Comparable Wet Processing / Clean equipment documented in the Waferpedia catalog.
6 comparable tools
EV Group
301
Wet Processing / Clean
The EVG 301 is a semi-automated single wafer cleaning system for R&D, featuring megasonic cleaning, spinner rotation up to 3000 rpm, and optional pre-bonding and IR-inspection modules.
Tokyo Electron
Expedius Plus
Wet Processing / Clean
Tokyo Electron Expedius Plus is a wet bench for pre-diffusion clean applications.
Veeco
Waferstorm 3300 M 3303 M 3304 Single Wafer Processing
Wet Processing / Clean
Veeco / SSEC Waferstorm 3300 / M 3303 / M 3304 is a single wafer processing system for 6-inch wafers.
SCREEN
WS 620 C
Wet Processing / Clean
The SCREEN / DNS WS 620 C is a wet bench specified for 6-inch wafers and described as convertible to 8-inch.
Semitool
003163-000 SRD
Wet Processing / Clean
YES
1000FP
Wet Processing / Clean
The Glen/YES 1000FP is a plasma cleaning system designed to accept a range of shelf sizes for changing flat panel industry needs.
Compare interactively
Need a side-by-side spec table? Open the compare tool to pick any two models.
Compare SEZ SP 304 with another model →