Comparison ledger
Laurell H6-23, Laurell WS-650-15, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | H6-23Laurell | WS-650-15Laurell |
|---|---|---|
| OEM | Laurell | Laurell |
| Category | Spin coater | Spin coater |
| Wafer size | 150mm | 300mm |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | 650-series HL | 650-series |
| Family | Laurell H6-23 | Laurell WS-650-15 |
| Cited variants | — | |
| Specifications | ||
| Maximum rotational speed | 12,000 RPM (based on a ø 100mm silicon wafer)[4] | 12,000 RPM (based on a ø 100mm silicon wafer)[1] |
| Wafer capacity | Up to ø 150mm wafers[4] | up to ø 300mm wafers[1] |
| Substrate capacity | 5" × 5" (127mm × 127mm) substrates[4] | 9" × 9" (229mm × 229mm) substrates[1] |
| Power | 95 to 240VAC, 47/63HZ, ~300 Watts[4] | 95 to 240VAC, 47/63HZ, ~300 Watts[1] |
| Category | Spin coater[4] | — |
| Wafer size | Up to 150 mm wafers[4] | — |
| Substrate size | 5 in x 5 in (127 mm x 127 mm) substrates[4] | — |
| Speed basis | Based on a 100 mm silicon wafer[4] | Based on a 100mm silicon wafer[1] |
| Series | 650-series HL coater system[4] | — |
| Model | — | WS-650-15[1] |
| Configuration | — | Station mounted[1] |
| Process controller | — | 650-series process controller[1] |
| Processes supported | — | Coating, Etching, Developing, Rinsing-Drying and Cleaning[1] |
Plan your fab
Building a Spin coater process? Get a complete equipment list.
Open the fab equipment planner →