Oxford Instruments
100 ICP Fluorine alternatives
Comparable Etch equipment documented in the Waferpedia catalog.
6 comparable tools
Applied Materials
0010 47763
Etch
The Applied Materials 0010-47763 is an electrostatic chuck (ESC) assembly used in semiconductor etching processes.
Applied Materials
0010-16392 ESC Assembly
Etch
The Applied Materials 0010-16392 is an electrostatic chuck assembly designed for 300 mm wafer processing, featuring a dual electrode configuration.
Applied Materials
0041-39086 ESC Part
Etch
Tegal
1512e
Etch
The Tegal 1512e is an industrial RIE plasma etcher system with modules assembly for CI-4222.
Axcelis
200 ACU
Etch
The Axcelis 200 ACU is an asher or plasma asher used in semiconductor processing.
Plasma-Therm
210RL-A
Etch
The Plasma-Therm 210RL-A is a reactive-ion etch (RIE) system designed for semiconductor and microelectromechanical systems (MEMS) fabrication, belonging to the class of plasma-based dry etching equipment.
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