Waferpedia

Comparison ledger

SS W 80 A-ARversus1000FP

SCREEN SS W 80 A-AR, YES 1000FP, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMSCREENYES
CategoryWet Processing / CleanWet Processing / Clean
Wafer size200mm—
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilySCREEN SS W 80YES 1000FP
Specifications
ConfigurationFully upgraded DNS SS-W80A-AR:[1]—
Wafer size200mm Notch Standard Silicon Wafer Substrate (Left to Right wafer flow)[1]—
MakeSCREEN / DNS[1]—
ModelSS W 80 A-AR[1]Glen/YES 1000FP[2]
Wafer Sizes8 inch[1]—
Scrubbing Units2 front, 2 back side[1]—
Reverse Units2[1]—
DI Water RinseIncluded[1]—
Back RinseIncluded[1]—
Brush RinseIncluded[1]—
Nano DIW with N2Included[1]—
Wafer substrate200mm notch standard silicon wafer substrate[1]—
CommunicationSECS II or GEM included[1]—
Wafer log trackingReal time wafer log tracking system per each wafer[1]—
Auto back-up systemIncluded[1]—
Recipe processingWafer level recipe processing; multi recipe/job processing per cassette (max 25 recipes per 1 cassette)[1]—
Automatic wafer collection featureIncluded[1]—
Auto teaching featureIncluded[1]—
System type—Plasma cleaning system[2]
Line—R-Series Plasma Cleaning Systems (Glen Technologies)[2]
Designed use—Designed to accept a range of shelf sizes[2]
Application focus—Changing needs of the flat panel industry[2]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]web.archive.orgweb.archive.org