Comparison ledger
Semitool 11600 SRD, SSEC 3302 Resist Removal and Wafer, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 11600 SRDSemitool | |
|---|---|---|
| OEM | Semitool | SSEC |
| Category | Wet Processing / Clean | Wet Processing / Clean |
| Wafer size | — | Wafer processing modules (2) |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Semitool 11600 SRD | SSEC 3302 Resist Removal and Wafer |
| Specifications | ||
| Configuration | Ceramic[1] | — |
| Manufacturer | Semitool[1] | — |
| Model | 11600 SRD[1] | — |
| Equipment type | Spin Rinse Dryer[1] | — |
| Wafer size | — | Wafer processing modules (2)[2] |
| Voltage | — | 220V, 3 Ph, 60 Hz, 30A[2] |
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