Comparison ledger
SUSS MicroTec 150 e Mask, Ultratech LSA 100 A Wafer, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 150 e MaskSUSS MicroTec | LSA 100 A WaferUltratech |
|---|---|---|
| OEM | SUSS MicroTec | Ultratech |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | SUSS MicroTec 150 e Mask | Ultratech LSA 100 A Wafer |
| Specifications | ||
| Configuration | — | Laser Spike Anneal (LSA)[1] |
| Voltage | — | 115 VAC / 1 Phase / 50/60 Hz[2] |
| Tool type | — | Wafer Stepper[1] |
| Optics | — | Laser Spike Anneal (LSA)[2] |
| Power | — | 115 VAC / 1 Phase / 50/60 Hz[2] |
| Current | — | 15 Amps FLA / 6 Amps Largest Load[2] |
| Included module | — | Laser[2] |
Plan your fab
Building a Lithography process? Get a complete equipment list.
Open the fab equipment planner →