Waferpedia

Comparison ledger

AS8 / 12versusELP300 Gen2

SUSS MicroTec AS8 / 12, SUSS MicroTec ELP300 Gen2, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
AS8 / 12SUSS MicroTec
ELP300 Gen2SUSS MicroTec
OEMSUSS MicroTecSUSS MicroTec
Category——
Wafer size300mm300mm
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation—Gen2
FamilySUSS MicroTec AS8 / 12SUSS MicroTec ELP300 Gen2
Specifications
OperationManual[1]—
Wafer Sizeup to 300 mm[1]up to 300 mm[1]
ProcessSpray Coating[1]—
Automation—Automated[1]
Laser Type—Excimer Laser[1]
Processes—Alignment, Ablation, Laser-Assisted Debonding, Laser Seed Layer Removal[1]
Sources (1)Every fact above is drawn from these public sources
  1. [1]hilpert.chhilpert.ch