Waferpedia

Comparison ledger

160 XP IonversusE 500 EHP

Varian 160 XP Ion, Varian E 500 EHP, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
E 500 EHPVarian
OEMVarianVarian
CategoryIon ImplantationIon Implantation
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyVarian 160 XP IonVarian E 500 EHP
Specifications
Configuration150mm High Current IMP[1]—
OEMVarian[2]—
Model160 XP Ion[2]—
CategoryIon Implantation[1]Ion Implantation[5]
Tool typeion implanter[1]—
Voltage—208 V[3]
Frequency—50 Hz[4]
Phase—3 Phase[3]
Implanter type—Medium current implanter[6]
Maximum beam energy—250 kV[3]
Wire configuration—5 Wire[3]
Wafer size—6"[3]
Convertible to 8"—Yes[6]
Thin wafer handling kit—Included[6]

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Sources (6)Every fact above is drawn from these public sources
  1. [1]waferpedia.comwaferpedia.com
  2. [2]Equipment inventory listing
  3. [3]tarasemi.comtarasemi.com
  4. [4]inventory listing
  5. [5]waferpedia.comwaferpedia.com
  6. [6]waferpedia.comwaferpedia.com