Comparison ledger
ABM -407B-2-S-CE-S293 Robot, Onto Innovation Nanospec 6100, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Nanospec 6100Onto Innovation | |
|---|---|---|
| OEM | ABM | Onto Innovation |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | ABM -407B-2-S-CE-S293 Robot | Onto Innovation Nanospec 6100 |
| Cited variants | — |
|
| Specifications | ||
| Model | ABM-407B-2-S-CE-S293[2] | — |
| Description | ROBOT[2] | — |
| Refurbished RTP RTA | AG Associates 4100, 4108, 8108, 8800, 8800i,210, 310, 410, 610, 610I, MPT RTP-600S, 800S, RTP-3000[2] | — |
| KLA-Tencor Spare Parts and Service | RS-35C,RS-55,RS-75,RS-100,UV-1050,UV-1080,UV-1250,UV-1280,ASET F5 / F5X,AIT Systems,HRP-220 Stylus Profiler[2] | — |
| Refurbished Isotropic Plasma Etcher | Matrix, Tegal, Lam Research, Branson/IPC, PlasmaTherm[2] | — |
| Refurbished PECVD, ALD Equipment | Cambridge, Oxford PlasmaLab , Plasma-Therm, STS/SPTS, AMAT[2] | — |
| Refurbished Mask Aligner | Canon Neutronix PLA501/545, Suss MA200CC, MA8BA8 GEN3, MA8BA8 GEN2, MA8BA8, MA200E[2] | — |
| Refurbished Bonding | SUSS SB6E, SUSS SB8E, EVG 620 BA, EVG EV501, West Bond 7200AR 7400A[2] | — |
| Refurbished Wafer Prober | Electroglas EG 4090u+, EG 4090, EG 2001X, EG 1034X, Cascade PS-21[2] | — |
| Measurement Range | — | 25 – 200,000 Å (0.0025 – 20 micrometers)[1] |
| Optional UV Measurement Range | — | 25 Å – 500 Å[1] |
| Spectral Range | — | 210 – 800 nm (continuous scanning)[1] |
| Standard Objective Lenses | — | 4X, 10X, 40X[1] |
| Optional UV Objective Lens | — | 15X reflecting UV objective[1] |
| Wafer Size Compatibility | — | 100mm/150mm or 150mm/200mm[1] |
| Operating System | — | Windows 95[1] |
| Microprocessor | — | 32-bit Pentium[1] |
| Light Source (Standard) | — | Regulated tungsten halogen lamp[1] |
| Light Source (Optional UV) | — | Deuterium UV source[1] |
| Focusing | — | Automated focusing[1] |