Comparison ledger
Applied Materials 0010-03485 Magnet Assy, SCREEN SU 3200 Single Wafer Processing, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03485 Magnet AssyApplied Materials | |
|---|---|---|
| OEM | Applied Materials | SCREEN |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-03485 Magnet Assy | SCREEN SU 3200 |
| Specifications | ||
| Configuration | WP AL 300mm PVD[1] | 12 Chamber Aquaspin[5] |
| OEM | Applied Materials[1] | — |
| Model | 0010-03485[1] | — |
| Description | MAGNET ASSY, WP AL 300MM PVD[2] | — |
| Process | PVD[3] | SOM / SPM / SC1/ SC2 / 03W / DHF[5] |
| Wafer size | 300mm[4] | 12 inch (300 mm)[5] |
| Version | Spares[4] | — |
| Part Number | 0010-03485[1] | — |
| Manufacturer | Applied Materials[1] | — |
| Process Type | PVD (Physical Vapor Deposition)[1] | — |
| Application (Material) | Aluminum (AL)[1] | — |
| Wafer Diameter (associated) | 300 mm[1] | — |
| Factory Interface | — | FOUP (4)[5] |
| Handler System | — | Kawasaki[5] |
| Software Version | — | Standard[5] |
| CIM | — | SECS / GEMS[5] |
| Software version | — | P2485STD00V2485STD00[6] |
| System power rating | — | 208AC-3 Phase[6] |
| Maximum chambers | — | 12 chambers in four three-level towers[7] |
| Throughput | — | up to 800 wafers per hour (WPH)[7] |
| Chemical supply options | — | dynamic direct injection (DDI) or cabinet-type chemical supply system[7] |
| Chamber volume reduction | — | about one-third of the previous model[7] |
| Processes | — | SOM / SPM / SC1/ SC2 / 03W / DHF[5] |
| Power rating | — | 208AC-3 Phase[6] |