Waferpedia

Comparison ledger

0010-03485 Magnet AssyversusTwin Gamma

Applied Materials 0010-03485 Magnet Assy, SUSS MicroTec Twin Gamma, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-03485 Magnet AssyApplied Materials
Twin GammaSUSS MicroTec
OEMApplied MaterialsSUSS MicroTec
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-03485 Magnet AssySUSS MicroTec Twin Gamma
Specifications
ConfigurationWP AL 300mm PVD[1]—
OEMApplied Materials[1]—
Model0010-03485[1]—
DescriptionMAGNET ASSY, WP AL 300MM PVD[2]—
ProcessPVD[3]—
Wafer size300mm[4]4 inch and 6 inch wafers[5]
VersionSpares[4]—
Part Number0010-03485[1]—
ManufacturerApplied Materials[1]—
Process TypePVD (Physical Vapor Deposition)[1]—
Application (Material)Aluminum (AL)[1]—
Wafer Diameter (associated)300 mm[1]—
Machine type—Coater and developer[5]
System structure—Separate coating and developing modules with integrated wafer transfer station[5]
Coater robot—Genmark GB4S with needle gripper[5]
Developer robot—Genmark GB4S with needle gripper[5]
Coater cups—2[5]
Developer cups—3[5]
Sources (5)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]semistarcorp.comsemistarcorp.com
  3. [3]layla-ec.comlayla-ec.com
  4. [4]fabsurplus.comfabsurplus.com
  5. [5]f.machineryhost.comf.machineryhost.com