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Comparison ledger

0010-13622 RF Match forversusProducer GT DARC

Applied Materials 0010-13622 RF Match for, Applied Materials Producer GT DARC, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-13622 RF Match forApplied Materials
Producer GT DARCApplied Materials
OEMApplied MaterialsApplied Materials
CategoryDepositionDeposition
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-13622 RF Match forApplied Materials Producer
Specifications
ConfigurationHigh Efficiency HE RF Match-Bias[1]3 Channels[2]
Model0010-13622[1]—
Product TypeRF Match for PVD (Physical Vapor Deposition)[1]—
FeatureHigh Efficiency HE RF Match-Bias[1]—
Gas—SiH4, N2O, NH3[2]
FOUP Ports—4[2]
Number of channels—3[2]
Process gases—SiH4, N2O, NH3[2]
Number of FOUP ports—4[2]
Chiller model—SMC HRW008-H1S-DY-X007[2]
Power supply type 1—Advanced Energy Apex 3013 (x6)[2]
Power supply type 2—Advanced Energy /PDX 900 (x6)[2]
Power supply type 3—MKS Astron 2L (x6)[2]
Vintage—2016[2]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing