Comparison ledger
Applied Materials 0010-13622 RF Match for, CHA Mark 40 C, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-13622 RF Match forApplied Materials | Mark 40 CCHA |
|---|---|---|
| OEM | Applied Materials | CHA |
| Category | Deposition | Deposition |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-13622 RF Match for | CHA Mark 40 |
| Specifications | ||
| Configuration | High Efficiency HE RF Match-Bias[1] | CHA SR-10 E-Beam Power Supply (10kW)[2] |
| Model | 0010-13622[1] | — |
| Product Type | RF Match for PVD (Physical Vapor Deposition)[1] | — |
| Feature | High Efficiency HE RF Match-Bias[1] | — |
| Process Chamber Dimensions | — | 26” x 26”[2] |
| Crucible | — | 4 pockets, 15cc each[2] |
| Power | — | 10kW Heater Power Supply (CHA HPS-671-10)[2] |
| Ion Gauge Tube | — | IG-100N[2] |
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