Comparison ledger
Applied Materials 0010-22161 High EFF RF Match, SUSS MicroTec AS 8, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-22161 High EFF RF MatchApplied Materials | AS 8SUSS MicroTec |
|---|---|---|
| OEM | Applied Materials | SUSS MicroTec |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-22161 High EFF RF Match | SUSS MicroTec AS 8 |
| Specifications | ||
| Make | Applied Materials[1] | — |
| Model | 0010-22161[1] | — |
| Description | HTESC PH 1 REV A[2] | — |
| Condition | Used[2] | — |
| Stock Number | BM6628[2] | — |
| Substrate size (round) | — | up to 200 mm[3] |
| Substrate size (square) | — | up to 6" edge length[3] |
| Dual-nozzle substrate sizes | — | Ø150 mm, Ø200 mm[3] |
| Single-nozzle substrate sizes | — | Ø3", Ø100 mm, Ø150 mm, Ø200 mm[3] |
| Z-axis adjustment range | — | up to 45 mm[3] |
| Nozzle adjustment range | — | 67.5 mm to 107.5 mm[3] |
| Spray axis maximum velocity | — | 500 mm/s[3] |
| Spray axis acceleration | — | up to 9 m/s²[3] |
| Chuck maximum rotation speed | — | 1,000 rpm[3] |
| Heated chuck | — | optional[3] |
| Splash-ring design | — | included[3] |