Comparison ledger
Applied Materials PLAD, Axcelis 200 PCU, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | PLADApplied Materials | 200 PCUAxcelis |
|---|---|---|
| OEM | Applied Materials | Axcelis |
| Category | Ion Implantation | Ion Implantation |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | 2000 Vintage |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials PLAD | Axcelis NV GSD 200 |
| Cited variants | — | |
| Specifications | ||
| Manufacturer | Applied Materials[3] | — |
| Model | PLAD[3] | — |
| Category | Ion Implantation[3] | — |
| Tool type | Plasma Doping Ion Implanter[4] | — |
| Wafer size | 300 mm[4] | — |
| P/N | — | SC 4840 A[5] |
| Frequency | — | 50 Hz[5] |
| Phase | — | 3 Phase[5] |
| Voltage | — | 400 V[5] |
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