Comparison ledger
Canon FPA 3000 i 5 + Fine Pattern, SUSS MicroTec MA 200 Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | MA 200 MaskSUSS MicroTec | |
|---|---|---|
| OEM | Canon | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Canon FPA 3000 | SUSS MicroTec MA 200 |
| Cited variants | — | |
| Specifications | ||
| Configuration | Main 1:[2] | With CIC1000 lamp housing[4] |
| Phase | 3 Phase[2] | — |
| Wafer sizes supported | 6 inch[3] | — |
| Power supply main 1 | 3 Phase - 3 Wire - 50/60 Hz[2] | — |
| Power supply main 2 | 1 Phase - 2 Wire - 50/60 Hz[2] | — |
| Vintage | 1997[2] | — |
| Hardware | — | Intel Standard[4] |
| Operation | — | Semi-automatic[4] |
| Wafer sizes | — | 6 inch, 8 inch[4] |
| Optics | — | UV400/cont/W-200[4] |
| Sensor | — | 365/405 dual range[4] |
| Lamp housing | — | CIC1000[4] |
| Computer hardware | — | Intel Standard[4] |
| Alignment system | — | SUSS AL3000 Auto Align[4] |
| Microscope | — | DVM8 with Sony cameras, L25X Objective (qty 2)[4] |
| Mask holder | — | with Guard[4] |
| Field Expanders | — | Yes[4] |
| Wafer sizes (from other listing) | — | 6, 8 inch[5] |
| OEM | — | SUSS[4] |
| Model | — | MA 200[4] |
| Equipment type | — | Mask Aligner[4] |
| Wafer size | — | 8 inch[4] |
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