Waferpedia

Comparison ledger

100 SpinversusFalcon

CEE 100 Spin, SUSS MicroTec Falcon, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
FalconSUSS MicroTec
OEMCEESUSS MicroTec
CategoryResist ProcessingResist Processing
Wafer size—Wafer Backside Rinse
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyCEE 100SUSS MicroTec Falcon
Specifications
ConfigurationVolts 115[1]Polyimid[2]
Cassette Elevators—2[2]
Developer Dispensers—2[2]
Wafer size—Wafer Backside Rinse[2]
Number of Hot Plates—0[2]
Number of Chill Plates—0[2]
Controller Type—Microprocessor Controller[2]
Power Requirements—380 V, 50/60 Hz, 3 Phase[2]

Plan your fab

Building a Resist Processing process? Get a complete equipment list.

Open the fab equipment planner →
Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing