Waferpedia

Comparison ledger

1000 Hot PlateversusLCD1-16NV-3

CEE 1000 Hot Plate, Despatch LCD1-16NV-3, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
LCD1-16NV-3Despatch
OEMCEEDespatch
CategoryThermal / DiffusionThermal / Diffusion
Wafer size—100mm
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyCEE 1000 Hot PlateDespatch LCD1-16NV-3
Specifications
Configuration4"[1]—
TypeHot Plate[1]—
Wafer Size4 inch[1]—
Equipment type—oven for polymer curing[2]
Intended use—Only for biocompatible devices[2]
Wafer carriers—100mm and 150mm wafers[2]
Piece parts—allowed[2]
Atmosphere—nitrogen circulation[2]
Filter—high efficiency particulate air filter[2]
Temperature monitoring—possibility to monitor temperature[2]
Maximum temperature—350°C[2]
Location—Zone 11[2]
Wafer sizes supported—100mm, 150mm[2]
Piece parts allowed—Yes[2]
Nitrogen circulation—Yes[2]
High efficiency particulate air filter—Yes[2]
Usage restriction—Biocompatible devices only[2]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]epfl.chepfl.ch