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Comparison ledger

1000 Hot PlateversusTelindy Plus ALD High K Vertical

CEE 1000 Hot Plate, Tokyo Electron Telindy Plus ALD High K Vertical, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMCEETokyo Electron
CategoryThermal / DiffusionThermal / Diffusion
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyCEE 1000 Hot PlateTokyo Electron Telindy Plus ALD High K Vertical
Specifications
Configuration4"[1]—
TypeHot Plate[1]—
Wafer Size4 inch[1]—
Manufacturer—Tokyo Electron[2]
Model—Telindy Plus ALD High K Vertical[3]
Category—Thermal / Diffusion[4]
Tool type—vertical furnace for semiconductor processing[4]
Wafer size—12 inch[3]
Process—ALDZROX 2.2[5]
Process temperature—300C[5]
Wafer type—300mm-Si SEMI STD-Notch[5]
Quantity of production wafers—100wfr[5]
Boat operation—2 Boat Operation (B/S)[5]
Boat type—117 slots Ladder (8mm pitch)[5]
Boat material—Quartz[5]
Boat rotation—Yes[5]
Pedestal type—Quartz[5]
Cap heater—Yes[5]
Load lock—Yes[5]
O2 analyzer maker/model—NGK, SH-304 STANDARD[5]
Software version—Ver. 6.07 3.1.1[5]

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Sources (5)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]waferpedia.comwaferpedia.com
  3. [3]Equipment inventory listing
  4. [4]waferpedia.comwaferpedia.com
  5. [5]media-moov-co.s3.us-west-1.amazonaws.commedia-moov-co.s3.us-west-1.amazonaws.com