Comparison ledger
CEE 1000 Hot Plate, YES 15 HMDS Vapor Prime, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | ||
|---|---|---|
| OEM | CEE | YES |
| Category | Thermal / Diffusion | Thermal / Diffusion |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | CEE 1000 Hot Plate | YES 15 HMDS Vapor Prime |
| Specifications | ||
| Configuration | 4"[1] | — |
| Type | Hot Plate[1] | — |
| Wafer Size | 4 inch[1] | — |
| Chamber dimensions | — | 16" x 16" x 16"[2] |
| Heater power | — | 1700 W[2] |
| Wafer size | — | 8 inch[3] |
| Dehydration temperature | — | 150 °C[4] |
| Operating temperature | — | 102–104 °C[4] |
| Process time for HMDS vapor prime | — | ~30 minutes[4] |
| Process time for substrate dehydration | — | ~60 minutes[4] |
| Gauge | — | Granville Phillips 275 Convectron Gauge[2] |
| Temperature controller | — | included[2] |
| Logical sequencer | — | included[2] |
| HMDS cylinder | — | included[2] |
| Fixed shelf | — | included[2] |
| Chamber Dimensions | — | 16" x 16" x 16" with fixed shelf[2] |
| Temperature Controller | — | Yes (included)[2] |
| Process Sequences | — | Sequence 1 for HMDS Vapor Prime Process, Sequence 2 for substrate dehydration[4] |
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