Waferpedia

Comparison ledger

1305 BSG 3versusGasonics Aura 1000

Hitachi 1305 BSG 3, Lam Research Gasonics Aura 1000, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
1305 BSG 3Hitachi
Gasonics Aura 1000Lam Research
OEMHitachiLam Research
CategoryWet Processing / CleanWet Processing / Clean
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyHitachi 1305 BSG 3Lam Research Gasonics Aura 1000
Specifications
Configuration—Tabletop (4)[1]
Configurations—Tabletop (4) or Floor (1)[1]
Power Requirement—208VAC 3-Phase[2]
Process Gases—O2, CF4[2]
Plasma Source—Microwave (magnetron)[2]
Chamber Material—Ceramic/Quartz[2]
Pneumatics Power—Nitrogen or Clean Dry Air (CDA)[2]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]manualslib.commanualslib.com