Comparison ledger
Hitachi HL 7500 M E-Beam Lithography, SUSS MicroTec 150 e Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | HL 7500 M E-Beam LithographyHitachi | 150 e MaskSUSS MicroTec |
|---|---|---|
| OEM | Hitachi | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Hitachi HL 7500 M E-Beam Lithography | SUSS MicroTec 150 e Mask |
| Specifications | ||
| Configuration | 6" reticle mask line[1] | — |
| Reticle mask format | 6 inch reticle mask line[1] | — |
| Vintage year | 2004[1] | — |
| Category | Lithography[2] | — |
Plan your fab
Building a Lithography process? Get a complete equipment list.
Open the fab equipment planner →