Comparison ledger
Lam Research A 6 Exelan HPT, Oxford Instruments 100 ICP Fluorine, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | A 6 Exelan HPTLam Research | 100 ICP FluorineOxford Instruments |
|---|---|---|
| OEM | Lam Research | Oxford Instruments |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | 1997 manufactured | — |
| Control system | — | — |
| Generation | — | — |
| Family | Lam Research A 6 Exelan HPT | Oxford Instruments 100 ICP Fluorine |
| Specifications | ||
| Configuration | 3 Chambers[1] | — |
| Manufacturer | Lam Research[2] | — |
| Model | Alliance A 6 Exelan HPT Dielectric[2] | — |
| Category | Etch[2] | — |
| Wafer size | 8 inch (200 mm)[2] | 4 inch, 6 inch, 8 inch (with clamp change)[4] |
| Chamber configuration | Exelan HPT chambers (2) and 4520 chamber[2] | — |
| Vacuum & pumping | 1 TM Pump to Dual Pump (1 for Load Lock / 1 for TM)[3] | — |
| Gas & chemistry | To use 10 Gases, the Gas Box needs to be enhanced[3] | — |
| Configuration & options | 3 Chambers[1] | — |
| Condition | Refurbished[1] | — |
| Last confirmed date | November 12, 2024[1] | — |
| Vintage year | 1997[2] | — |
| Gas box note | To use 10 gases, the Gas Box needs to be enhanced[1] | — |
| Etch Gases | — | SF6, CF4, O2, Ar, N2, CHF3, C4F8[4] |
| Cryo DRIE etch rate | — | up to 5 µm/min[4] |
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