Comparison ledger
Lam Research Rainbow 4506 I, Oxford Instruments 100 ICP Fluorine, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Rainbow 4506 ILam Research | 100 ICP FluorineOxford Instruments |
|---|---|---|
| OEM | Lam Research | Oxford Instruments |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Lam Research Rainbow | Oxford Instruments 100 ICP Fluorine |
| Specifications | ||
| Configuration | Oxide Etch[1] | — |
| Wafer type | Jeida flat[1] | — |
| Valve type | AC4 Throttle / VAT Throttle[1] | — |
| Software | Classic 7.31-42[1] | — |
| RF | PDW2200 400Kc generator (main chamber)[1] | — |
| Robot type | Harmonic Drive[1] | — |
| Loader type | Hine indexers 38A[1] | — |
| Loadlock | Entrance (ISO chmbr) and Exit LL[1] | — |
| Turbo pumps | No[1] | — |
| Controllers | VAT controller ISO THV / AC4 controller main chamber THV[1] | — |
| GAS 1 | Ar: 500 sccm[1] | — |
| GAS 2 | CF4: 100 sccm[1] | — |
| GAS 3 | CHF3: 50 sccm[1] | — |
| GAS 4 | He: 1000 sccm[1] | — |
| GAS 5 | O2: 20 sccm[1] | — |
| GAS 6 | N2: 540 sccm[1] | — |
| Type | Plasma etcher[2] | — |
| Wafer sizes | 6 inch, 8 inch[1] | — |
| Process | Oxide etch[1] | — |
| Endpoint | Monochromator Endpoint[1] | — |
| RF cart | Present[1] | — |
| ISO module | Present[1] | — |
| GAS 7 | NF3: 1150 sccm[1] | — |
| GAS 8 | He: 480 sccm[1] | — |
| Etch Gases | — | SF6, CF4, O2, Ar, N2, CHF3, C4F8[3] |
| Cryo DRIE etch rate | — | up to 5 µm/min[3] |
| Wafer size | — | 4 inch, 6 inch, 8 inch (with clamp change)[3] |
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