Comparison ledger
Laurell EDC-650-15B, Laurell WS-650-15 B, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | EDC-650-15BLaurell | WS-650-15 BLaurell |
|---|---|---|
| OEM | Laurell | Laurell |
| Category | Resist Processing | Resist Processing |
| Wafer size | 300mm | 300mm |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Laurell EDC-650-15B | Laurell WS-650-15 B |
| Specifications | ||
| Type | EDC System[1] | Spin Coater[3] |
| Series | 650 Series[1] | 650-series[4] |
| Max substrate size | 300 mm (9" x 9")[1] | ø 300mm wafers and 9" × 9" (229mm × 229mm) substrates[4] |
| Max RPM | 12,000 rpm[1] | 12000 rpm[3] |
| Mounting options | Tabletop, In-Deck, On-Deck[1] | — |
| Model | EDC-650-15B[1] | WS-650-15 B[4] |
| Maximum speed | 12,000 rpm[1] | — |
| Recommended speed | 3,000 RPM[2] | — |
| Recommended chuck type | non-vacuum chucks[2] | — |
| Controller | — | 650-series[3] |
| Max Substrate Size | — | ø 300mm (9" × 9")[3] |
| Mounting Options | — | Tabletop, In-Deck, On-Deck[3] |
| OEM | — | Laurell[4] |
| Category | — | Spin Coater[3] |
| Processes supported | — | Coating, Etching, Developing, Rinsing-Drying and Cleaning[4] |
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