Comparison ledger
Nikon NSR-2205i11D, SUSS MicroTec 150 e Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | NSR-2205i11DNikon | 150 e MaskSUSS MicroTec |
|---|---|---|
| OEM | Nikon | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | 0.35 micron | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Nikon NSR-2205i11D | SUSS MicroTec 150 e Mask |
| Specifications | ||
| Tool type | Step-and-Repeat System[1] | — |
| Process node | 0.35 micron[1] | — |
| Node | 0.35 micron[1] | — |
| Technology Node | 0.35 micron[1] | — |
| Type | Step-and-repeat system[1] | — |
| Resolution node | 0.35 micron[1] | — |
| Machine type | Step-and-Repeat System[1] | — |
| Target design node | 0.35 micron[1] | — |
| System type | Step-and-repeat system[1] | — |
| Target node | 0.35 micron[1] | — |
| Design node | 0.35 micron[1] | — |
| Node (resolution) | 0.35 micron[1] | — |
| Resolution | 0.35 micron[1] | — |
| Minimum feature size | 0.35 μm[1] | — |
| Design Rule | 0.35 micron[1] | — |
| Feature Size | 0.35 micron[1] | — |
| Description | State-of-the-art workhorse[1] | — |
| Equipment type | Step-and-repeat system[1] | — |
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