Comparison ledger
Nikon Super Coolscan 5000 ED Slide, SUSS MicroTec 150 e Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 150 e MaskSUSS MicroTec | |
|---|---|---|
| OEM | Nikon | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | 2003– | — |
| Lifecycle | — | — |
| Lifecycle milestones | 2026 Third-party support only | — |
| Control system | — | — |
| Generation | — | — |
| Family | Nikon Super Coolscan 5000 ED Slide | SUSS MicroTec 150 e Mask |
| Cited variants |
| — |
| Specifications | ||
| Equipment type | Fixed film, movable plane single-pass optical scanning system[2] | — |
| Supported originals | 35mm mounted slides and 35mm film strips[2] | — |
| Optical resolution | 4000 dpi[2] | — |
| Density range | 4.8[3] | — |
| A/D conversion | 16-bit[3] | — |
| Output bit depth | 8-bit or 16-bit[2] | — |
| Connection interface | USB 2.0[3] | — |
| Software | Nikon Scan 4.0[2] | — |
| Scanning speed | Preview scans in 11 seconds; full scans as fast as 20 seconds[4] | — |
| ICE technology | Digital ICE4[4] | — |
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