Comparison ledger
Plasma-Therm Versaline ICP Deep Silicon, Tegal 1512e, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Versaline ICP Deep SiliconPlasma-Therm | 1512eTegal |
|---|---|---|
| OEM | Plasma-Therm | Tegal |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Plasma-Therm Versaline ICP | Tegal 1512e |
| Specifications | ||
| Phase | 208/220 VAC, 3 Phase[1] | — |
| Configuration | 30 A, 4-Wire[1] | — |
| Process type | Inductively coupled plasma etcher[1] | — |
| Application | Deep silicon etch[2] | — |
| Electrical requirements | 208/220 VAC, 3 phase, 30 A, 4-wire, 50/60 Hz[1] | — |
| Compatible materials | Si[2] | — |
| Incompatible materials | III-V / Hi K / Metal[2] | — |
| Tool type | — | Industrial RIE plasma etcher system[3] |
| Stated configuration | — | With modules assembly for CI-4222[3] |
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