Waferpedia

Comparison ledger

421 Spray Solventversus1000FP

Semitool 421 Spray Solvent, YES 1000FP, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMSemitoolYES
CategoryWet Processing / CleanWet Processing / Clean
Wafer sizeBatch Solvent Processor for Wafer Cleaning—
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilySemitool 421YES 1000FP
Cited variants—
Specifications
Process ApplicationsPolymer Removal, Resist Stripping, Wafer Cleaning, Metal Lift-Off[2]—
Wafer sizeBatch Solvent Processor for Wafer Cleaning[2]—
Max Wafer Size8"/200mm Wafers[2]—
ConfigurationSingle Chamber[2]—
Chamber TypeSingle Chamber[2]—
Number of Tanks4[2]—
Heated Tanks2[2]—
Ambient Tanks2[2]—
Rotor Included1[2]—
Max Wafers per Batch50 wafers[3]—
Vintage2004[2]—
Wafer Size200 mm[1]—
System type—Plasma cleaning system[4]
Line—R-Series Plasma Cleaning Systems (Glen Technologies)[4]
Model—Glen/YES 1000FP[4]
Designed use—Designed to accept a range of shelf sizes[4]
Application focus—Changing needs of the flat panel industry[4]

Plan your fab

Building a Wet Processing / Clean process? Get a complete equipment list.

Open the fab equipment planner →
Sources (4)Every fact above is drawn from these public sources
  1. [1]hfsemi.comhfsemi.com
  2. [2]inventory listing
  3. [3]classoneequipment.comclassoneequipment.com
  4. [4]web.archive.orgweb.archive.org