Comparison ledger
Semitool Raider ECD 312 Electroplating, Semitool Raider ECD Electroplating, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Raider ECD 312 ElectroplatingSemitool | Raider ECD ElectroplatingSemitool |
|---|---|---|
| OEM | Semitool | Semitool |
| Category | Lab & Support Equipment | Deposition |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Semitool Raider ECD | Semitool Raider ECD |
| Specifications | ||
| Phase | 3 Phase[1] | 3 Phase[2] |
| Configuration | 50/60 Hz[1] | 5 Wire[2] |
| Voltage | 380 V[1] | 208 V[2] |
| Loadport | 3 X FOUP[1] | — |
| PC | FUI[1] | — |
| Power Phase | 3 Phase[1] | — |
| Frequency | 50/60 Hz[1] | — |
| Wafer Handling Robot | Xfer Robot, 1x Linear Dual Arm with Edge Grip Endeffector[1] | — |
| Vacuum and Rinse | Vacuum prewet, 1 Stack SRD[1] | — |
| Chemical Tanks | 11[1] | — |
| Chillers | 4[1] | — |
| Controller | PC with FUI[1] | — |
| Chamber Components | Chamber lift assy, Spin motor, Push plate control board, Plate sylinder (2), Contact Ring (only ECD), Lip seal (only eCD), Flow pump (only eCD), Anode basket (only eCD)[1] | — |
| Tank Components | Tank body, Circulation pump, Filter housing, Heater housing, Level sensor (5), Tank remote board, Tank control block[1] | — |
| Vintage | 2011[1] | — |
| Wafer size | — | 300 mm[3] |
| Electrical specification | — | 3 Phase, 208 V, 5 Wire, 50/60 Hz, 125 amp[2] |
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