Waferpedia

Tool family

Applied Materials VIISTA

Models in this family

  1. The Applied Materials / Varian VIISta 80 is a high current ion implanter designed for 200 mm wafer processing.

  2. The Applied Materials / Varian VIISta HC is an ion implanter.

  3. The Applied Materials / Varian VIISta HC Ion Implant is an ion implantation system.

  4. Applied Materials / Varian VIISta HCP+ is a 12-inch high current ion implanter.

  5. The VIISta HCPi is a high-current ion implanter from Applied Materials (Varian) that processes 300 mm wafers.

  6. The Applied Materials / Varian VIISta HCS Ion Implanter is an ion implanter described as a 1-channel SCCM-type system with 6 gas lines.

  7. The VIISta HE XP is a high-current ion implanter for semiconductor wafer processing.

  8. Applied Materials / Varian VIISta Plad is a high current ion implanter with a 12-inch wafer size.

  9. Applied Materials / Varian VIISTA Trident XP Ion Implant System is an ion implant system with a standard process type and an XP beamline.

All entries

  1. VIISta 80 High CurrentApplied Materials

    The Applied Materials / Varian VIISta 80 is a high current ion implanter designed for 200 mm wafer processing.

    CategoryIon ImplantationWaferLaser Wafer Mapping
    33 specs
  2. VIISta HC IonApplied Materials

    The Applied Materials / Varian VIISta HC is an ion implanter.

    CategoryIon Implantation
    3 specs
  3. VIISta HC Ion ImplantApplied Materials

    The Applied Materials / Varian VIISta HC Ion Implant is an ion implantation system.

    CategoryIon Implantation
    7 specs
  4. VIISta HCP+Applied Materials

    Applied Materials / Varian VIISta HCP+ is a 12-inch high current ion implanter.

    CategoryIon Implantation
    6 specs
  5. VIISta HCPiApplied Materials

    The VIISta HCPi is a high-current ion implanter from Applied Materials (Varian) that processes 300 mm wafers.

    CategoryIon Implantation
    3 specs
  6. VIISta HCS IonApplied Materials

    The Applied Materials / Varian VIISta HCS Ion Implanter is an ion implanter described as a 1-channel SCCM-type system with 6 gas lines.

    CategoryIon Implantation
    7 specs
  7. VIISta HE XPApplied Materials

    The VIISta HE XP is a high-current ion implanter for semiconductor wafer processing.

    CategoryIon Implantation
    8 specs
  8. VIISta Plad High CurrentApplied Materials

    Applied Materials / Varian VIISta Plad is a high current ion implanter with a 12-inch wafer size.

    CategoryIon Implantation
    1 spec
  9. VIISTA Trident XP Ion ImplantApplied Materials

    Applied Materials / Varian VIISTA Trident XP Ion Implant System is an ion implant system with a standard process type and an XP beamline.

    CategoryIon Implantation
    49 specs