ASML PAS 2500

Models in this family

1. PAS 2500produced 1985–

   The PAS 2500 series was the first lithography system developed entirely by ASML and became the system that built the company.

   Cited variants

   Designation	Generation	Vintage	Changes	Source
   PAS 2500/10	—	1986	First model in the PAS 2500 series; 150 mm wafer size; 900 nm resolution; 250 nm overlay accuracy; 66 wafers per hour throughput.	steendrukmuseum.nl[1]
   PAS 2500/40	—	—	150 mm wafer size; reticle masking with four independent blades; dual automatic through-the-lens alignment; elliptical mirror and fly's eye integrator illumination; three axis HP laser interferometer position control.	semistarcorp.com[2]

Sources