ASML

5500 100

Research Quality: 30% complete

Provisional entry — research in progress

This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.

The PAS 5500/100 is a step-and-repeat i-line lithography system from ASML. The PAS 5500/100 was introduced for the 0.40-micron technology node.^[1]

Fig. — Manufacturer logo, not a photo of this toolWikimedia Commons (see file page for license)

What it is

General reference — not yet source-verified

The ASML 5500/100 is a stepper used for photolithography in semiconductor manufacturing. Steppers project a pattern from a reticle onto a photosensitive-coated wafer in a step-and-repeat manner, exposing one field at a time.

How it works

General reference — not yet source-verified

The ASML 5500/100 operates as a step-and-repeat lithography system. A reticle containing the pattern is illuminated, and a reduction lens projects the image onto a small area of the wafer.

Where it fits in the process flow

General reference — not yet source-verified

The stepper is used in the photolithography sector of a semiconductor fab, typically after the wafer has been coated with photoresist. Exposed wafers are then transferred to a developer station where the latent image is converted into a physical resist pattern.

The tool is employed for critical layer patterning in both front-end-of-line (FEOL) and back-end-of-line (BEOL) processes, wherever sub-micron resolution is required.

Why won't it start?

Documented failure modes, common issues, and field considerations.

Lens damage; needs replacement due to water leak.
Rust from water leak in the RH, LS sensor plat and near the stage.
About 20 parts swapped out for other use.
6 missing boards.
Missing modules in the ARMS.
Lamp holder is missing.

What do the numbers mean?

Configuration & options2

Lithography type: Step-and-repeat i-line^[1]
Technology node: 0.40 µm^[1]

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Where are the manuals?

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Not publicly documented

Field notes

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Frequently asked questions

What type of lithography system is the PAS 5500/100?

The PAS 5500/100 is an i-line step-and-repeat stepper.^[1]

For what technology node was the PAS 5500/100 designed?

The PAS 5500/100 was introduced for the 0.40-micron technology node.^[1]

Not publicly documented

The following facts about the 5500 100 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

Fewer than 3 independently cited specifications for the 5500 100 are on record; the remainder await public documentation.
Answerable by: an OEM datasheet, a cleanroom equipment inventory, or an engineer who operated or installed it
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 5500 100 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the 5500 100 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the 5500 100 are not on record.
Answerable by: an engineer who operated it or OEM installation records
The process node or technology generation of the 5500 100 is not on record.
Answerable by: an OEM datasheet or a fab qualification report