Axcelis
NV GSD 200 Ion
The Axcelis NV GSD 200 is an ion implanter supporting 6-inch wafers. The NV GSD 200 operates at a total energy of 200 KEV with a beam current of 50 mA. The NV GSD 200 has a throughput of 210 pieces per hour and a dose range of 5E11 to 1E16 ions/cm2.[1]
What it is
How it works
Where it fits in the process flow
General reference — not yet source-verifiedIon implantation is a front-end wafer doping step that follows pattern definition and precedes subsequent thermal steps used to activate or redistribute implanted species.
Applications
The Axcelis NV GSD 200 is suitable for wafer doping tasks that require a total energy of 200 keV, a beam energy of 5 keV, post acceleration high voltage of 80 keV, and a beam current of 50 mACE.[1]
What do the numbers mean?
Power & electrical5
- Post acceleration high voltage, 80 KEV[1]
Wafer handling6
Gas & chemistry6
Performance1
Control & software4
Configuration & options19
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- Phase3 Phase[1]
- Voltage208V, 710A[1]
- GasesB/As/Ar[1]
- Configuration(2) SDS gas lines (ASH3 and PH3)[1]
- Configuration(2) HP Gas lines (BF3 and ARGON)[1]
- ConfigurationPost acceleration high voltage, 80 KEV[1]
- Power3 Phase, 208V, 710A[1]
- Process gasesB/As/Ar[1]
- SDS gas lines2 lines (ASH3 and PH3)[1]
- HP gas lines2 lines (BF3 and ARGON)[1]
- Post acceleration high voltage80 KEV[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Not publicly documented
The following facts about the NV GSD 200 Ion are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the NV GSD 200 Ion are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the NV GSD 200 Ion are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the NV GSD 200 Ion are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the NV GSD 200 Ion are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the NV GSD 200 Ion is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (1)Every fact above is drawn from these public sources
- [1]Inventory photo
Last updated Oct 11, 2026.
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