KLA
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Produced
1993–
Power
60 Hz[1]
The KLA FLX 2320 A is a thin film stress measurement system.[1]
A thin film stress measurement system evaluates the mechanical stress present in deposited films on a wafer.
Film stress measurement commonly supports optical or curvature-based metrology workflows that compare wafer shape before and after film deposition.
Thin film stress metrology fits within process control after film deposition and before later process steps that depend on film integrity.
Thin film stress measurement helps assess whether a deposited layer is likely to remain mechanically stable during subsequent fabrication steps.
The KLA FLX 2320 A is used for thin film stress measurement in semiconductor manufacturing.[1]
The KLA FLX 2320 A was introduced in 1993.
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The following facts about the FLX 2320 A are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented variants, configuration options, or revision breakpoints of the FLX 2320 A are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the FLX 2320 A are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the FLX 2320 A are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the FLX 2320 A is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the FLX 2320 A are on record.
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Last updated Oct 5, 2026.
The KLA .204 PSL Wafer is an 8-inch NIST-traceable reference wafer compatible with Surfscan 6xy0 and Sp1 particle counters.
KLA .496 PSL Wafer is an 8-inch NIST traceable wafer stated to be capable on Surfscan 6xy0 and SP1.
The KLA .498 PSL Wafer is a NIST traceable reference wafer.