Waferpedia

KLA

RS 100

KLA RS 100 family
Research Quality: 40% complete

Provisional entry — research in progress

This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.

KLA RS 100 is a high-speed four-point probe resistivity tester. The KLA RS 100 measures sheet resistance on wafers from 2 to 12 inches. The KLA RS 100 uses an integrated heater/temperature-sensor and ceramic probe conditioning plate for stable measurements.[1]

RS 100 — Inventory photo
Fig. 01RS 100Inventory photo[2]

Power

200–240 VAC[1]

Vacuum

Min 25 inHg[1]

What it is

The KLA RS 100 is a four-point probe (4PP) system designed for sheet resistance and resistivity measurements of conductive films on semiconductor wafers. The RS 100 accommodates wafer sizes of 200 mm (8 inch) and 300 mm (12 inch). The system includes an integrated heater and temperature sensor, a ceramic probe conditioning plate, and an optical wafer aligner with a CCD camera and ring illuminator. The RS 100 uses a Pentium III computer running Windows NT with software version 2.31.[2][1]

Applications

The RS 100 is applicable to a wide range of materials, including polysilicon, copper, and bulk silicon substrates. The system supports routine checks with 1 to 30 programmable test sites and XY mapping or user-defined patterns with up to 1,200 sites. The edge exclusion for measurements is 1 mm from the edge of the conductive film. Applications span metal deposition, CMP, ion implantation, and diffusion process monitoring.[1]

What do the numbers mean?

Power & electrical1

AC voltage
200–240 VAC[1]
Accurate?

Vacuum & pumping2

Vacuum requirement
Min 25 inHg[1]
Accurate?
Air supply
80–100 PSI[1]
Accurate?

Wafer handling3

Wafer size range
2 to 12 inch[1]
Accurate?
Wafer loading
Manual, open cassette (200/300mm)[1]
Accurate?
Wafer aligner
High-speed, on-stage optical aligner with CCD and ring illuminator[1]
Accurate?

Performance3

Absolute accuracy
±1% of certified value (NIST traceable, corrected to 23°C)[1]
Accurate?
Measurement repeatability
<0.2% (1σ) at 1σ test diameter with appropriate probe head[1]
Accurate?
Probe head types
Type A, B, C, D, E, F, H (one precision probe head)[1]
Accurate?

Control & software3

Computer system
Pentium III with keyboard and trackball[1]
Accurate?
Operating system
Windows NT[1]
Accurate?
Software version
2.31[1]
Accurate?

Configuration & options6

Measurement type
Sheet resistance (four-point probe)[1]
Accurate?
Measurement range
>5 mΩ/sq to <5 MΩ/sq[1]
Accurate?
Reproducibility (metals)
<0.5% for Cu, W, TiN[1]
Accurate?
Edge exclusion
1 mm from edge of conductive film[1]
Accurate?
Sites programmable (routine)
1 to 30 sites (ASTM standard tests included)[1]
Accurate?
Sites programmable (mapping)
Up to 1,200 sites (XY maps and user-defined patterns)[1]
Accurate?
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • AC voltage200–240 VAC[1]
  • Vacuum requirementMin 25 inHg[1]
  • Air supply80–100 PSI[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Frequently asked questions

What wafer sizes does the KLA RS 100 support?

The RS 100 accommodates 200 mm (8 inch) and 300 mm (12 inch) wafers, and also supports manual loading for all wafer diameters from 2 inch to 12 inch.[2][1]

What is the measurement range and accuracy of the RS 100?

The measurement range is greater than 5 mΩ/sq to less than 5 MΩ/sq. Absolute accuracy, based on NIST-traceable standards corrected to 23°C, is ±1% of the certified value.[1]

What repeatability and reproducibility does the RS 100 achieve?

Measurement repeatability per the KLA-Tencor Probe Qualification Test at a 1 mm test diameter is less than 0.2% (1σ). Reproducibility for representative metals (e.g., Cu, W, TiN) is less than 0.5%.[1]

What computer system and software does the RS 100 use?

The RS 100 is controlled by a Pentium III computer with keyboard and trackball, running Windows NT. The software version is 2.31.[1]

What are the typical applications for the RS 100?

Typical applications include measuring sheet resistance after metal deposition, CMP, ion implantation, and diffusion. The system can measure materials such as polysilicon, copper, and bulk silicon substrates.[1]

Not publicly documented

The following facts about the RS 100 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the RS 100 are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the RS 100 are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the RS 100 are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the RS 100 are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the RS 100 is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

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Sources & citations

Sources (2)Every fact above is drawn from these public sources
  1. [1]jenesisequipment.com — jenesisequipment.comjenesisequipment.com
  2. [2]Inventory photo
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Last updated Sep 28, 2026.

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