Nikon
S 203 B
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
What it is
Where it fits in the process flow
General reference — not yet source-verifiedIn a semiconductor fabrication line, the S 203 B is used for critical-layer patterning in front-end-of-line (FEOL) and back-end-of-line (BEOL) processing. The scanner operates in a cleanroom environment and receives wafers that have been coated with photoresist, then transfers the patterned image before the wafer moves to develop and etch steps.
What do the numbers mean?
Wafer handling1
Configuration & options2
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What type of equipment is the Nikon S 203 B?
The Nikon S 203 B is a DUV scanner used for semiconductor lithography.[2]
What wafer size does the Nikon S 203 B support?
The Nikon S 203 B is an 8-inch (200 mm) wafer tool.[2]
What light source configuration is available for the Nikon S 203 B?
The Nikon S 203 B can be configured with a Cymer ELS 5410 excimer laser.[2]
Not publicly documented
The following facts about the S 203 B are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the S 203 B are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the S 203 B are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the S 203 B are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the S 203 B are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the S 203 B is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (2)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]waferpedia.com — waferpedia.comwaferpedia.com
Last updated Sep 24, 2026.
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