OAI
806 Mask
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The OAI 806 Mask Aligner is a UV photolithography tool. The OAI 806 Mask Aligner patterns substrates up to 6 inches. The OAI 806 Mask Aligner supports soft contact, hard contact, and proximity contact modes.[1]
What it is
How it works
General reference — not yet source-verifiedA mask aligner places a photomask close to a wafer and aligns the mask pattern to features already on the wafer before exposure.
A mask aligner exposes the resist on the wafer through the mask using ultraviolet light.
Where it fits in the process flow
General reference — not yet source-verifiedA mask aligner sits in the lithography module of a fabrication flow.
A mask aligner is used before pattern transfer steps that follow resist exposure and development.
Applications
The OAI 806 is used for photolithography research and prototyping.[1]
What do the numbers mean?
Power & electrical1
Vacuum & pumping1
Wafer handling3
Optics & imaging8
Performance3
Configuration & options14
Vintage & configurations
Documented models & variants
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| MBA 806 | — | — | Manual wafer load mask aligner with 350W NUV lamphouse, 5x objectives, Thomson Industries Quickslide system, and specific mask holder/chuck configurations. | classoneequipment.com[3] |
What replaced it?
Alternatives
Tools documented as functional equivalents — same process step and wafer size, from a different manufacturer. Each equivalence cites its source.
- SUSS MicroTec MA 6 Mask— Same function class: Lithography, nullCompare in depthsource[4]
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Which exposure modes does the OAI 806 support?
The OAI 806 supports soft contact, hard contact, and proximity contact modes.[1]
Does the OAI 806 support backside alignment?
The OAI 806 supports optional backside alignment.[1]
What optical source does the OAI 806 use?
The OAI 806 uses a collimated UV light source.[1]
What kinds of devices is the OAI 806 used to fabricate?
The OAI 806 is used to fabricate semiconductors, MEMS, and photonic devices.[1]
Not publicly documented
The following facts about the 806 Mask are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 806 Mask are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the 806 Mask are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 806 Mask are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the 806 Mask is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the 806 Mask are on record.
Answerable by: an OEM parts catalog or a service engineer
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (4)Every fact above is drawn from these public sources
- [1]waferpedia.com — waferpedia.comwaferpedia.com
- [2]Equipment inventory listing
- [3]classoneequipment.com — classoneequipment.comclassoneequipment.com
- [4]snfguide.stanford.edusnfguide.stanford.edu
Last updated Oct 7, 2026.
Compare with similar tools
View all →
The SUSS MA 6 Mask Aligner is a semiconductor lithography tool used for mask alignment and exposure, supporting various wafer sizes and featuring infrared alignment and a split-field microscope.
Brooks 017-0146-01 is a prealigner manufactured by Brooks.