Waferpedia

Semitool

880

Spin Rinser/Dryer4"Semitool 880 family
Research Quality: 60% complete
880 — nanofab.ece.cmu.edu
Fig. 01880nanofab.ece.cmu.edu[1]

What it is

The Semitool 880 is a spin rinser/dryer.[1][2]

How it works

The tool rinses masks and wafers in deionized water to 15 MΩ and dries them with heated nitrogen.[1]

Where it fits in the process flow

The tool accepts 4-inch and 5-inch mask boats, and a 6-inch wafer boat is available on request.[1]

What can it run?

Process applications and technology nodes documented for this tool.

  • Rinsing masks
  • Rinsing wafers
  • Drying masks
  • Drying wafers

What do the numbers mean?

Wafer handling1

Boat compatibility
4" and 5" mask boats, plus 6" wafer boat on request[1]
Accurate?

Configuration & options3

Function
Spin Rinser/Dryer[1]
Accurate?
Rinse medium
DI water to 15 MΩ[1]
Accurate?
Drying method
Heated nitrogen[1]
Accurate?
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What replaced it?

  • siblingSemitool 270— Listed alongside the Semitool 270 as a Spin Rinser/Dryer in the wet chemistry equipment list.source[2]
  • siblingSemitool 870— Listed alongside the 870 in the same wet chemistry equipment category.source[2]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Frequently asked questions

What does the Semitool 880 do?

It rinses masks and wafers in deionized water to 15 MΩ and dries them with heated nitrogen.[1]

What mask or wafer sizes does it handle?

It uses 4-inch and 5-inch mask boats, and a 6-inch wafer boat is available on request.[1]

Not publicly documented

The following facts about the 880 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 880 are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the 880 are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the 880 are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the 880 are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the 880 is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

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Sources & citations

Sources (2)Every fact above is drawn from these public sources
  1. [1]nanofab.ece.cmu.edu — nanofab.ece.cmu.edunanofab.ece.cmu.edu
  2. [2]Equipment - Claire & John Bertucci Nanotechnology Laboratory - College of Engineering - Carnegie Mellon University — nanofab.ece.cmu.edunanofab.ece.cmu.edu
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Last updated Sep 22, 2026.

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