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Tokyo Electron

Act 12 DUV Photoresist Coater Developer Track

The Tokyo Electron Act 12 DUV Photoresist Coater / Developer Track is a deep ultraviolet photoresist coater and developer track. The Tokyo Electron Act 12 DUV Photoresist Coater / Developer Track is configured for 300 mm, 12 inch wafers. The Tokyo Electron Act 12 DUV Photoresist Coater / Developer Track has right-to-left wafer flow.[1][2]

Act 12 DUV Photoresist Coater Developer Track — Inventory photo
Fig. 01Act 12 DUV Photoresist Coater Developer TrackInventory photo[1]

Wafer size

The direction of wafer flow is right to left

Gas delivery

Chemical Cabinet 1[1]

How it works

The ACT 12 includes a closed-loop temperature and humidity system. The track also includes chemical cabinets, a temperature-control unit, system temperature and humidity modules with filter systems, and a wafer transport interface for in-line connection to a Nikon NSR-S204B scanner.[1][2]

Where it fits in the process flow

The ACT 12 is connected in-line with a Nikon NSR-S204B scanner. The tool therefore fits into a lithography line as the wafer-handling and resist-processing companion to the exposure system.[2][1]

Why won't it start?

Documented failure modes, common issues, and field considerations.

  • Temp. Cont. Unit / system leaky and deactivated
  • T&H chamber requires service
  • Resist pump status unclear
  • 1 FOUP load port defective
  • IRA Z driver missing
  • WEE unit defective

What do the numbers mean?

Wafer handling8

Wafer size
The direction of wafer flow is right to left[1]
Accurate?
Wafer size
300mm – 12inch wafer setup[1]
Accurate?
4 FOUP load ports for 12” wafers[1]
Accurate?
Wafer size
IFB for wafer transport system NIKON NSR-S204B[1]
Accurate?
Wafer size
300 mm / 12 inch[1]
Accurate?
Wafer flow direction
right to left[1]
Accurate?
Load ports
4 FOUP load ports for 12 inch wafers[1]
Accurate?
IFB
for wafer transport system NIKON NSR-S204B[1]
Accurate?

Gas & chemistry7

Dispense Monitoring system on all 24 resist lines[1]
Accurate?
Aut- air vent function on all resist LE tanks[1]
Accurate?
Chemical Cabinet 1[1]
Accurate?
Chemical Cabinet 2[1]
Accurate?
Chemical Cabinet 3[1]
Accurate?
Model
Act 12 DUV Photoresist Coater / Developer Track[1]
Accurate?
Category
Resist Processing[1]
Accurate?

Control & software3

Type 4 Main controller[1]
Accurate?
Several Software Options[1]
Accurate?
Main controller
Type 4[1]
Accurate?

Configuration & options17

Dual Block[1]
Accurate?
2 COT units[1]
Accurate?
2 BARC units[1]
Accurate?
4 DEV units[1]
Accurate?
1 WEE unit[1]
Accurate?
2 ADH units[1]
Accurate?
Closed Loop T&H System[1]
Accurate?
AC Power Box[1]
Accurate?
Temp. Cont. Unit SMC[1]
Accurate?
OEM
Tokyo Electron[1]
Accurate?
COT units
2[1]
Accurate?
BARC units
2[1]
Accurate?
DEV units
4[1]
Accurate?
WEE unit
1[1]
Accurate?
ADH units
2[1]
Accurate?
Closed loop T&H system
Included[1]
Accurate?
Vintage
2009[1]
Accurate?
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • ConfigurationDispense Monitoring system on all 24 resist lines[1]
  • ConfigurationAut- air vent function on all resist LE tanks[1]
  • ConfigurationChemical Cabinet 1[1]
  • ConfigurationChemical Cabinet 2[1]
  • ConfigurationChemical Cabinet 3[1]
  • ModelAct 12 DUV Photoresist Coater / Developer Track[1]
  • CategoryResist Processing[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Not publicly documented

The following facts about the Act 12 DUV Photoresist Coater Developer Track are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Act 12 DUV Photoresist Coater Developer Track are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the Act 12 DUV Photoresist Coater Developer Track are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the Act 12 DUV Photoresist Coater Developer Track are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • The process node or technology generation of the Act 12 DUV Photoresist Coater Developer Track is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

  • No publicly documented compatible parts, consumables, or accessories for the Act 12 DUV Photoresist Coater Developer Track are on record.

    Answerable by: an OEM parts catalog or a service engineer

Sources & citations

Sources (2)Every fact above is drawn from these public sources
  1. [1]Inventory photo
  2. [2]Tokyo Electron ACT 12 DUV Photoresist Coater and Developer for sale via bidding — linkedin.comlinkedin.com
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Last updated Oct 4, 2026.

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