Ulvac
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The Ulvac SOPHI 200 Ion is an ion implantation tool. The Ulvac SOPHI 200 Ion has a beam current of about 500 μA. The Ulvac SOPHI 200 Ion has throughput of more than 100 pieces per hour for 6-inch wafers.[1]
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The following facts about the SOPHI 200 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the SOPHI 200 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the SOPHI 200 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the SOPHI 200 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the SOPHI 200 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the SOPHI 200 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Last updated Oct 8, 2026.