YES
The YES B2 is a plasma processing system in the Shuttlelock Ready Series.[1]
The YES B2 uses a process module with a main cabinet and remote equipment.[1]
The YES B2 requires site planning, installation preparation, and utilities connections before operation.[1]
The YES B2 is used for plasma processing applications that rely on controlled gas handling, electrical power, exhaust, vacuum, and water or heat-transfer support.[1]
The user manual states a revised January 1998 date.
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| SLR-720 | — | — | Reactive Ion Etch system with RF-powered substrate electrode and circulating-liquid temperature control. | nanofab.utah.edu[1] |
| SLR-730 | — | — | PECVD system with RF-powered top electrode and substrate temperature control by embedded resistance heater; stated temperature range is 80 C to 400 C. | nanofab.utah.edu[1] |
| SLR-734 | — | — | PECVD/RIE combination system with RF power switchable between top and bottom electrodes; substrate temperature control by embedded resistance heater; stated temperature range is 80 C to 400 C. | nanofab.utah.edu[1] |
| SLR-740 | — | — | PE/RIE combination system with RF power switchable between top and bottom electrodes and circulating-liquid temperature control. | nanofab.utah.edu[1] |
| SLR-770 ICP | — | — | ICP system with top coil supplied 2 MHz RF at 1000 Watts maximum and bottom electrode supplied 13.56 MHz RF at 500 Watts maximum. | nanofab.utah.edu[1] |
| SLR-770 ECR | — | — | ECR system with lower electrode RF power and temperature control, plus a tuner, a high density source with an electromagnet, and a microwave power supply. | nanofab.utah.edu[1] |
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
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The following facts about the B2 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
The control-system platform and OS era of the B2 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the B2 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the B2 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the B2 are on record.
Answerable by: an OEM parts catalog or a service engineer
No publicly hosted manuals, SOPs, or datasheets for the B2 are on record.
Answerable by: university cleanroom staff or an OEM application specialist
No research found yet — worked with this tool? Share what you know.
Last updated Oct 9, 2026.