Comparison ledger
ABM -407B-1-S-CES293 Robot, Zeiss NVision 40, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | NVision 40Zeiss | |
|---|---|---|
| OEM | ABM | Zeiss |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | ABM -407B-1-S-CES293 Robot | Zeiss NVision 40 |
| Specifications | ||
| Model | ABM-407B-1-S-CES293[1] | NVision 40[2] |
| Description | ROBOT[1] | — |
| Refurbished RTP RTA | AG Associates 4100, 4108, 8108, 8800, 8800i,210, 310, 410, 610, 610I, MPT RTP-600S, 800S, RTP-3000[1] | — |
| KLA-Tencor Spare Parts and Service | RS-35C,RS-55,RS-75,RS-100,UV-1050,UV-1080,UV-1250,UV-1280,ASET F5 / F5X,AIT Systems,HRP-220 Stylus Profiler[1] | — |
| Refurbished Isotropic Plasma Etcher | Matrix, Tegal, Lam Research, Branson/IPC, PlasmaTherm[1] | — |
| Refurbished PECVD, ALD Equipment | Cambridge, Oxford PlasmaLab , Plasma-Therm, STS/SPTS, AMAT[1] | — |
| Refurbished Mask Aligner | Canon Neutronix PLA501/545, Suss MA200CC, MA8BA8 GEN3, MA8BA8 GEN2, MA8BA8, MA200E[1] | — |
| Refurbished Bonding | SUSS SB6E, SUSS SB8E, EVG 620 BA, EVG EV501, West Bond 7200AR 7400A[1] | — |
| Refurbished Wafer Prober | Electroglas EG 4090u+, EG 4090, EG 2001X, EG 1034X, Cascade PS-21[1] | — |
| Configuration | — | 208-230 V[2] |
| Manufacturer | — | Zeiss[2] |
| Electron microscope type | — | SEM-FIB[3] |
| SEM column | — | Schottky field emission Gemini column[4] |
| SEM operating voltage | — | 100 V to 30 kV[4] |
| SEM resolution | — | 1.1 nm at 20 kV; 2.5 nm at 1 kV[4] |
| FIB column | — | SIINT Zeta Ga+ ion FIB column[4] |
| FIB operating voltage | — | 1 kV to 30 kV[4] |
| FIB ion current | — | 0.1 pA to 45 nA[4] |
| Ion beam resolution | — | 4 nm at 1 pA[4] |
| Power | — | 208-230 V[2] |
| Frequency | — | 50-60 Hz[2] |
| Gas delivery | — | Has W, C SiO2 and H20 gases installed[5] |
| Micromanipulator | — | With kleindiek mm3a micromanipulator[2] |
| XeF2 | — | Option, not installed[2] |
| Controller status | — | One of the controllers on the two turbo pumps is not operational[5] |
| Detectors | — | Everhart-Thornley detector, 4 quadrant backscatter, in-lens secondary electron detector, energy selective backscatter detector[4] |
| Lithography system | — | Raith Elphy Quantum lithography system[4] |
| Nanoscale lithography | — | NanoPattern Generating System (NPGS)[6] |