Comparison ledger
Applied Materials 0010-22161 High EFF RF Match, Ulvac Phi Adept 1010 Automated Depth Profiling, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-22161 High EFF RF MatchApplied Materials | |
|---|---|---|
| OEM | Applied Materials | Ulvac |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-22161 High EFF RF Match | Ulvac Phi Adept 1010 Automated Depth Profiling |
| Specifications | ||
| Make | Applied Materials[1] | — |
| Model | 0010-22161[1] | Phi Adept 1010[3] |
| Description | HTESC PH 1 REV A[2] | — |
| Condition | Used[2] | — |
| Stock Number | BM6628[2] | — |
| Manufacturer | — | Ulvac[3] |
| Instrument type | — | Quadrupole dynamic secondary ion mass spectrometer (SIMS)[4] |
| Primary beam energy range | — | 0.25–11 keV[5] |
| Mass range | — | 1–340 amu[5] |
| Net weight | — | 1,350 kg[4] |
| Shipping weight | — | ~2,400 kg[4] |
| Power supply | — | 200–230 V AC, 50/60 Hz, 50 A (single-phase)[4] |
| Operating temperature | — | 20°C ± 3°C[4] |
| Relative humidity | — | <50%[4] |