Waferpedia

Comparison ledger

6Mversus1000P

Dektak 6M, YES 1000P, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
6MDektak
OEMDektakYES
CategoryWet Processing / CleanWet Processing / Clean
Wafer size6"—
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones—1998 Acquisition
Control system——
Generation——
FamilyDektak 6MYES 1000P
Specifications
Instrument typeStylus profilometer[1]—
Equipment typeCleanroom Instrumentation; Metrology; Microscopy/Surface Analysis; Surface Analysis[1]—
Measured featureFilm step height[1]—
Measurement rangeSteps from 260 microns down to 10 nm[1]—
Additional usesSurface topography profiling and surface roughness measurement in the nanometer range[1]—
Stylus radius25-micron radius high aspect ratio stylus[1]—
Maximum acceptable sample size6 inches[1]—
LocationFNT 4.106[1]—
ContactDr. Raluca Gearba[1]—
Step height measurement range260 µm to 10 nm[1]—
Maximum sample size6 inches[1]—
Model—1000P[2]
System type—Plasma cleaning system[2]
Shelf configuration—Four 16 x 16 inch shelves[2]
Total capacity—1024 square inches[2]
Control system—PLC driven with plain English real time process readout and diagnostics in the event of system abort[2]
Number of shelves—4[2]
Shelf size—16 x 16 inches[2]
Power—1000 W[3]
Configuration—Parallel plate[3]
Operation modes—Active, RIE, Downstream[2]
Sample size range—From smallest semiconductor chip to large flat panels[2]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]tmi.utexas.edutmi.utexas.edu
  2. [2]web.archive.orgweb.archive.org
  3. [3]semistarcorp.comsemistarcorp.com