Waferpedia

Comparison ledger

Spectra G 800versus1000P

Edwards Spectra G 800, YES 1000P, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMEdwardsYES
CategoryWet Processing / CleanWet Processing / Clean
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones—1998 Acquisition
Control system——
Generation——
FamilyEdwards Spectra G 800YES 1000P
Specifications
Configuration4 port inlets[1]Parallel plate[4]
Phase3 Phase[1]—
Maximum gas flow rate800 slm[2]—
Number of inlet ports1 to 4[2]—
Electrical supply200-208 VAC 3-phase[2]—
Frequency50/60 Hz[2]—
Power consumption4 kW[2]—
Nitrogen supply pressure7 bar[2]—
Fuel gas supply pressure137 mbar (2 psi)[2]—
Extract flow rate60 Nm3/min[2]—
Mass658 Kg[2]—
Combustion stages4-stage[2]—
Number of inlet ports (listing source)4 port inlets[1]—
Model—1000P[3]
System type—Plasma cleaning system[3]
Shelf configuration—Four 16 x 16 inch shelves[3]
Total capacity—1024 square inches[3]
Control system—PLC driven with plain English real time process readout and diagnostics in the event of system abort[3]
Number of shelves—4[3]
Shelf size—16 x 16 inches[3]
Power—1000 W[4]
Operation modes—Active, RIE, Downstream[3]
Sample size range—From smallest semiconductor chip to large flat panels[3]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]web.archive.orgweb.archive.org
  3. [3]web.archive.orgweb.archive.org
  4. [4]semistarcorp.comsemistarcorp.com