Lam Research
4520 Oxide alternatives
Comparable Etch equipment documented in the Waferpedia catalog.
6 comparable tools
Nordson
March AP 1000
Etch
The Nordson March AP 1000 is a plasma system used for etching, operating at 50 Hz with a CB current of 25 A and an SCCR of 10 kA.
Nordson
March AP 300
Etch
The Nordson March AP 300 is a plasma system with a 300 Watt, 13.56 MHz RF generator and an integrated RF automated tuning network assembly.
Applied Materials
0010 47763
Etch
The Applied Materials 0010-47763 is an electrostatic chuck (ESC) assembly used in semiconductor etching processes.
Applied Materials
0010-16392 ESC Assembly
Etch
The Applied Materials 0010-16392 is an electrostatic chuck assembly designed for 300 mm wafer processing, featuring a dual electrode configuration.
Applied Materials
0041-39086 ESC Part
Etch
Oxford Instruments
100 ICP Fluorine
Etch
Oxford Instruments 100 ICP Fluorine is an inductively coupled plasma etcher for fluorine-based etching, supporting cryo DRIE and multiple etch gases including SF6 and C4F8.
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